Title :
Conditioner characterization and implementation for impacts of diamonds on CMP pad texture and performance
Author :
Zhan Liu;John McCormick;Todd Buley
Author_Institution :
Dow Electronic Materials, The Dow Chemical Company, 451 Bellevue Rd., Newark, DE USA
Abstract :
This paper reports a conditioner characterization method to quantify diamond characteristics with precise statistical measurements and implementation of this method to understand the impact of conditioners on pad texture and performance. Differences in diamond characteristics across different types of disks, and differences between batches of the same type of disk were observed and quantified. Diamond wear was also successfully quantified by the histogram shifts. The paper explains how variations in conditioning disks can impact polishing performance via their impact on texture.
Keywords :
"Diamonds","Histograms","Standards","Mechanical factors","Mathematical model","Couplings"
Conference_Titel :
Planarization/CMP Technology (ICPT), 2015 International Conference on