• DocumentCode
    3749930
  • Title

    Conditioner characterization and implementation for impacts of diamonds on CMP pad texture and performance

  • Author

    Zhan Liu;John McCormick;Todd Buley

  • Author_Institution
    Dow Electronic Materials, The Dow Chemical Company, 451 Bellevue Rd., Newark, DE USA
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    This paper reports a conditioner characterization method to quantify diamond characteristics with precise statistical measurements and implementation of this method to understand the impact of conditioners on pad texture and performance. Differences in diamond characteristics across different types of disks, and differences between batches of the same type of disk were observed and quantified. Diamond wear was also successfully quantified by the histogram shifts. The paper explains how variations in conditioning disks can impact polishing performance via their impact on texture.
  • Keywords
    "Diamonds","Histograms","Standards","Mechanical factors","Mathematical model","Couplings"
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2015 International Conference on
  • Type

    conf

  • Filename
    7412028