DocumentCode :
3752689
Title :
Fabrication of domain inverted ridge waveguide in ion-sliced LiNbO3 for wavelength conversion devices
Author :
Keisuke Tanaka;Toshiaki Suhara
Author_Institution :
Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
High-refractive-index-contrast thin film ridge waveguides can confine light more strongly than conventional Ti-indiffused and annealed/proton-exchanged waveguides. We fabricated domain inverted structures by voltage application method and ridge waveguides by proton-exchange accelerated etching in bonded ion-sliced thin film LiNbO3 crystals for implementation of highly efficient wavelength conversion devices.
Keywords :
"Optical waveguides","Optical device fabrication","Lithium niobate","Etching","Crystals","Acceleration"
Publisher :
ieee
Conference_Titel :
Microoptics Conference (MOC), 2015 20th
Print_ISBN :
978-4-8634-8487-0
Type :
conf
DOI :
10.1109/MOC.2015.7416469
Filename :
7416469
Link To Document :
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