DocumentCode
375738
Title
Large effective index and low bend loss in SOI optical waveguides
Author
Sakai, A. ; Hara, G. ; Baba, T.
Author_Institution
Div. of Electr. & Comput. Eng., Yokohama Nat. Univ., Japan
Volume
1
fYear
2001
fDate
15-19 July 2001
Abstract
We fabricated submicron rectangular waveguides with an ultra-high /spl Delta/ on an SOI substrate. A very large effective index over 4.4 and low bend loss less than 1 dB at 0.5-/spl mu/m-radius bend were demonstrated.
Keywords
electron beam lithography; optical fabrication; optical losses; optical planar waveguides; refractive index; silicon-on-insulator; Fabry-Perot resonance method; SOI optical waveguides; dense lightwave circuits; dispersion characteristics; electron beam lithography; large effective index; low bend loss; propagation characteristics; scattering loss; sidewall roughness; submicron rectangular waveguides; waveguide bend; Circuits; Etching; Optical films; Optical losses; Optical scattering; Optical waveguides; Propagation losses; Rectangular waveguides; Resonance light scattering; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.967698
Filename
967698
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