DocumentCode
375745
Title
Microstructure on titanium oxide and silicon nitride formed by KrF excimer laser ablation
Author
Shimoda, T. ; Takahashi, K. ; Obara, M.
Author_Institution
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Volume
1
fYear
2001
fDate
15-19 July 2001
Abstract
We have created conical microstructures on sintered flat TiO/sub 2/ and Si/sub 3/N/sub 4/ by near-threshold KrF laser ablation. The surface morphology and the chemical composition were analyzed with SEM and XPS, respectively.
Keywords
X-ray photoelectron spectra; laser ablation; scanning electron microscopy; silicon compounds; surface composition; surface structure; titanium compounds; KrF; KrF excimer laser ablation; SEM; Si/sub 3/N/sub 4/; TiO/sub 2/; XPS; chemical composition; conical microstructures; near-threshold KrF laser ablation; sintered flat Si/sub 3/N/sub 4/; sintered flat TiO/sub 2/; surface morphology; Ceramics; Chemical analysis; Chemical lasers; Laser ablation; Laser sintering; Microstructure; Shape; Silicon; Surface morphology; Titanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.967712
Filename
967712
Link To Document