DocumentCode :
375754
Title :
Preparation of In/sub 2/O/sub 3/ and ITO films using coating photolysis process with ArF excimer laser
Author :
Tsuchiya, T. ; Watanabe, A. ; Niino, H. ; Yabe, A. ; Yamaguchi, I. ; Manabe, T. ; Kumagai, T. ; Mizuta, S.
Author_Institution :
Nat. Inst. of Mater. & Chem. Res., Ibaraki, Japan
Volume :
1
fYear :
2001
fDate :
15-19 July 2001
Abstract :
To prepare the In/sub 2/O/sub 3/ and ITO films without heat treatment, we have studied the metal acetylacetonate coating photolysis process using an ArF excimer laser. In this paper, we will report the experimental procedures and our results.
Keywords :
X-ray diffraction; electrical resistivity; indium compounds; photolysis; pulsed laser deposition; semiconductor growth; semiconductor thin films; stoichiometry; tin compounds; ultraviolet spectra; ITO; In/sub 2/O/sub 3/; InSnO; UV spectra; XRD patterns; excimer laser; laser annealing; metal acetylacetonate coating photolysis; nonstoichiometry; patterning; resistivity; spin coating; thin film preparation; transmittance; Atmosphere; Coatings; Conductivity; Crystallization; Indium tin oxide; Optical control; Substrates; Transistors; X-ray diffraction; X-ray lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
Type :
conf
DOI :
10.1109/CLEOPR.2001.967723
Filename :
967723
Link To Document :
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