Title :
VUV laser micromachining and bulk modification of photonic materials
Author :
Jie Zhang ; Herman, P.R. ; Sugioka, K. ; Midorikawa, K.
Author_Institution :
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
Abstract :
In the paper, we report the surface patterning of wide-band-gap materials (GaN, SiC and fused silica), and the bulk modification of fused silica glass photosensitivity by the use of VUV light sources.
Keywords :
III-V semiconductors; gallium compounds; laser beam effects; laser beam machining; micromachining; optical glass; optical materials; refractive index; silicon compounds; surface treatment; wide band gap semiconductors; GaN; SiC; SiO/sub 2/; VUV laser micromachining; VUV light sources; bulk modification; fused silica; fused silica glasses; high fluence; internal refractive index structures; low fluence; photonic materials; photosensitivity; surface patterning; wide-band-gap materials; Chemical lasers; Gallium nitride; Glass; Micromachining; Optical materials; Optical pulses; Optical surface waves; Pump lasers; Refractive index; Silicon carbide;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
DOI :
10.1109/CLEOPR.2001.967841
