DocumentCode :
3758470
Title :
Effect of deposition time on structural, optical and morphological properties of facing-target sputtered TiO2 thin film
Author :
M. F. Hossain;Puspita Paul;T. Takahashi
Author_Institution :
Department of Electrical and Electronics Engineering, Rajshahi University and Engineering Technology, 6204, Bangladesh
fYear :
2015
Firstpage :
241
Lastpage :
244
Abstract :
The aim of this work is to deposit nanocrystalline TiO2 films by DC reactive facing-target sputtering (FTS) technique. The TiO2 films have been deposited in Fluorine doped tin-oxide (FTO) glass substrate by FTS with sputtering pressure of 2.0 Pa, and Ar/O2 gas ratio of 7:3. The main attraction of this paper is to correlate the structural, optical and morphological properties of these prepared TiO2 film with variation of deposition time (like 2, 4 and 12 hrs). The thickness of TiO2 film increases with the increase of deposition time. The correlation between the thickness variance and the structural, optical and morphological properties of TiO2 thin films has been investigated in details. From the results, it is cleared that the crystallinity, grain size and surface roughness enhance but cluster size reduces with the increase of deposition time. These prepared films have chanced to apply directly for dye-sensitized solar cell, photoelectrochemical cell and water splitting applications.
Keywords :
"Sputtering","Optical films","Photonic band gap","Surface morphology","Surface treatment","Substrates"
Publisher :
ieee
Conference_Titel :
Electrical & Electronic Engineering (ICEEE), 2015 International Conference on
Print_ISBN :
978-1-5090-1939-7
Type :
conf
DOI :
10.1109/CEEE.2015.7428267
Filename :
7428267
Link To Document :
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