A low-cost solution in generating multiple-bandgaps for 1.55 μm optical fibre communications

Author

Ng, S.L. ; Lim, H.S. ; Lam, Y.L. ; Chan, Y.C. ; Ooi, B.S. ; Aimez, V. ; Beauvais, J. ; Beerens, J.

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore

Volume

2

fYear

2001

fDate

2001

Firstpage

626

Abstract

We have demonstrated that a novel masking technique for low energy quantum well intermixing (QWI), comparable to selective area epitaxy, can be used for the realization of multiple bandgaps in the production of WDM quantum well laser sources, as well as other photonic integrated circuits for use in 1.55 μm optical fibre communications applications

Keywords

chemical vapour deposition; integrated optoelectronics; ion implantation; masks; optical communication equipment; optical fabrication; photoresists; quantum well lasers; semiconductor technology; ultraviolet lithography; wavelength division multiplexing; 1.55 micron; WDM quantum well laser sources; low energy quantum well intermixing; masking technique; multiple-bandgaps; optical fibre communications; photonic integrated circuits; Dry etching; Electrons; Implants; Optical fibers; Photoluminescence; Photonic band gap; Plasma applications; Plasma chemistry; Plasma immersion ion implantation; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE

Conference_Location

San Diego, CA

ISSN

1092-8081

Print_ISBN

0-7803-7105-4

Type

conf

DOI

10.1109/LEOS.2001.968971

Filename

968971