Research activities of optical MEMS in Japan

Author

Fujita, Hiroyulu

Author_Institution

Center for Int. Res. on MicroMechatronics, Univ. of Tokyo, Japan

Volume

1

fYear

2001

fDate

2001

Firstpage

66

Abstract

The key concept of MEMS (micro electro mechanical systems) technologies is to extend the VLSI fabrication capability to realize three- dimensional micro systems which are composed of electrical, mechanical, chemical and optical elements. Using VLSI fabrication processes such as photolithography, film deposition and etching, it is possible to obtain sub-micrometer-precision structures in a large quantity with excellent alignment between each other. In addition, movable structures such as micro mirrors and switches can be made by micromachining processes

Keywords

VLSI; etching; micro-optics; micromechanical devices; mirrors; optical communication equipment; optical fabrication; optical switches; photolithography; sputter etching; Japan; VLSI fabrication; VLSI fabrication processes; alignment structures; dry etching; film deposition; micro electro mechanical systems; micro mirrors; micromachining processes; optical MEMS; optical elements; photolithography; precise V-grooves; sputter etching; sub-micrometer-precision structures; wet etching; Chemical elements; Chemical technology; Etching; Lithography; Mechanical systems; Micromechanical devices; Mirrors; Optical device fabrication; Optical films; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE

Conference_Location

San Diego, CA

ISSN

1092-8081

Print_ISBN

0-7803-7105-4

Type

conf

DOI

10.1109/LEOS.2001.969175

Filename

969175