Field-induced generation of electron traps in the tunnel oxide of flash memory cells

The processes of trap generation and electron trapping in the tunnel oxide of SuperFlash memory cells have been analyzed. The strongly non-uniform distribution of electric field in the SuperFlash cell allowed us to rule out the electron- or hole-related mechanisms of trap generation. The experimental results of single-trap-induced modulation of the tunneling rate, and the analysis of field and potential distribution in the tunnel oxide, point to the high electric field as a direct cause of electron-trap generation.