Title :
Radiation testing of tantalum oxide-based resistive memory
Author :
Joshua Holt;Nathaniel Cady;Jean Yang-Scharlotta
Author_Institution :
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY, United States
Abstract :
Resistive memory (RRAM) is an emerging memory technology, expected to have inherent resistance to radiation damage. We present an initial study characterizing the effects of several types of radiation on a set of tantalum oxide-based RRAM devices. Gamma radiation (64.7 Mrad(Si)) was found to have no significant impact on switching properties. Likewise, ionic radiation (H, N, Ar+) up to 1015 ions/cm2 did not have any significant effect. This resistance to radiation, combined with high endurance and data retention, make RRAM an excellent candidate for use in harsh environments.
Keywords :
"Switches","Resistance","Radiation effects","Tantalum","Testing","Transistors","Electrodes"
Conference_Titel :
Integrated Reliability Workshop (IIRW), 2015 IEEE International
Print_ISBN :
978-1-4673-7395-1
Electronic_ISBN :
2374-8036
DOI :
10.1109/IIRW.2015.7437091