DocumentCode
376560
Title
Ion-beam sputtered TiO/sub 2/-SiO/sub 2/ mixed films for thin film filter in DWDM application
Author
Shiuh Chao
Author_Institution
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume
2
fYear
2001
fDate
15-19 July 2001
Abstract
TiO/sub 2/-SiO/sub 2/ mixed films were produced with ion beam sputter method. The refractive index of the mixed film was higher than that of conventional Ta/sub 2/O/sub 5/ films. Calculations show that bandwidth of thin film filters composed of the mixed films was significantly reduced.
Keywords
Rutherford backscattering; X-ray diffraction; annealing; optical communication equipment; optical films; optical filters; refractive index; silicon compounds; sputter deposition; sputtered coatings; titanium compounds; wavelength division multiplexing; DWDM; RBS; TiO/sub 2/-SiO/sub 2/; X-ray diffraction; crystallization temperature; high temperature annealing; ion-beam sputtered mixed films; refractive index; thin film filter; transmission spectrum; Band pass filters; Bandwidth; Chaos; Crystallization; Optical films; Refractive index; Sputtering; Temperature; Transistors; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.970882
Filename
970882
Link To Document