• DocumentCode
    3766975
  • Title

    Annealing temperature and spin speed effect on TiO2 nanostructured topology and electrical properties

  • Author

    I.H.H. Affendi;N. E. A. Azhar;M.S.P. Sarah;Salman A.H. Alrokayan;Haseeb A. Khan;M. Rusop

  • Author_Institution
    NANO-ElecTronic Centre (NET), Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450, Shah Alam, Selangor, Malaysia
  • fYear
    2015
  • Firstpage
    517
  • Lastpage
    521
  • Abstract
    TiO2 were deposited by using one of the sol-gel methods, the spin coating method. The speed of the spin coater used can be adjusted up to 8000rpm, but in this study only 1000rpm, 2000rpm and 3000rpm was used. There are 3 level of speed with different annealing temperature to provide a fine differentiation in between each parameter. These parameters will be characterized by current-voltage (I-V), Atomic Force Microscopy (AFM), UltraViolet-Visible spectrophotometry (UV-Vis) and RAMAN spectroscopy. As further discovered, lower rpm have quite a thick film that it could not be characterized by AFM, that makes some of the samples did not have AFM characterization. The highest point of the current at 10V in the IV graph is at 1000rpm spin speed and annealed at 425°C temperature of 6.1E-8 which then makes it the highest in conductivity at 5.39E+5.
  • Keywords
    "Films","Annealing","Substrates","Current measurement","Atomic measurements","Temperature measurement","Microscopy"
  • Publisher
    ieee
  • Conference_Titel
    Research and Development (SCOReD), 2015 IEEE Student Conference on
  • Type

    conf

  • DOI
    10.1109/SCORED.2015.7449390
  • Filename
    7449390