DocumentCode :
3768326
Title :
WR-1.5 band waveguide bandpass dual-mode filter on silicon micromachining technique
Author :
Zhongwan Zheng; Jiang Hu; Shuang Liu; Yong Zhang
Author_Institution :
EHF Key Laboratory of Fundamental Science for National Defense, University of Electronic Science and Technology of China, Chengdu, China
fYear :
2015
Firstpage :
112
Lastpage :
114
Abstract :
In this article, WR-1.5 rectangular waveguide cavity bandpass dual-mode filter based on silicon micromaching technique is designed. The filter consists of only two TE102/TE201 dual-mode cavities with four poles and two transmission zeros. The proposed filter is fabricated using the deep reactive ion etching (DRIE) micromachining on silicon wafers, with sputtering gold to inner and outer surface so as to realize metallization. Using Ansoft HFSS 13.0, the center frequency of filter is 650 GHz and the fractional bandwidth is 1.6%. The minimum in-band insertion loss is 2.18dB, and the in-band return loss is better than 18.42dB. One transmission zero is located on the passband´s lower side at 633.8 GHz while the second transmission zero is located on the upper side at 665.1 GHz.
Keywords :
"Resonant frequency","Gold","Micromachining","Bonding","Resists","Cavity resonators","Wireless communication"
Publisher :
ieee
Conference_Titel :
Communication Problem-Solving (ICCP), 2015 IEEE International Conference on
Print_ISBN :
978-1-4673-6543-7
Type :
conf
DOI :
10.1109/ICCPS.2015.7454103
Filename :
7454103
Link To Document :
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