Title :
Study of technology migration on 2nd generation current conveyors performance
Author :
Iskander, R. ; Kayed, S. ; Ragaie, H.F.
Author_Institution :
Mentor Graphics Corp., Cairo, Egypt
Abstract :
We have studied the technology migration effect on a CCII+ cell using a methodology that can be generalized for migrating analog cells between two technologies. The migration is based on optimization. The cell is migrated downward from 1.2μ to 0.5μ CMOS process technology. The cell performance is reevaluated
Keywords :
CMOS analogue integrated circuits; circuit optimisation; current conveyors; integrated circuit technology; 1.2 to 0.5 micron; CMOS process technology; analog cell; optimization; second generation current conveyor; technology migration; CMOS process; CMOS technology; Constraint optimization; Electronic design automation and methodology; Graphics; Impedance; Kirchhoff´s Law; Logic; Nuclear power generation; System-on-a-chip;
Conference_Titel :
Circuits and Systems, 2001. MWSCAS 2001. Proceedings of the 44th IEEE 2001 Midwest Symposium on
Conference_Location :
Dayton, OH
Print_ISBN :
0-7803-7150-X
DOI :
10.1109/MWSCAS.2001.986169
