DocumentCode :
3772145
Title :
Ellipsometry and its use in high voltage applications
Author :
A.-R. M. Zaghloul;R. M. Radwan;M. Elshazly-Zaghloul
Author_Institution :
Electrical Engineering Department, Faculty of Engineering, Cairo University, Egypt
fYear :
1978
fDate :
6/1/1978 12:00:00 AM
Firstpage :
103
Lastpage :
105
Abstract :
Ellipsometry is a technique that uses a light beam to probe the surface or volume under test. It is a very accurate technique to measure the complex dielectric constant ε* (= square of refractive index) of materials, and the thicknesses of overlaying films and their ε*´s.
Keywords :
"Films","Pollution measurement","Substrates","Reflection","Surface contamination","Ellipsometry","Thickness measurement"
Publisher :
ieee
Conference_Titel :
Electrical Insulation, 1978 IEEE International Conference on
Print_ISBN :
978-1-5090-3121-4
Type :
conf
DOI :
10.1109/EIC.1978.7463605
Filename :
7463605
Link To Document :
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