Extreme ultraviolet (EUV) sources based on synchrotron radiation

Author

Hesch, Klaus ; Pellegrin, Eric ; Rossmanith, Robert ; Steininger, Ralph ; Saile, Volker ; Wüst, Jürgen ; Dattoli, Guiseppe ; Doria, Andrea ; Gallerano, Gian Piero ; Giannessi, Luca ; Ottaviani, Pier Luigi ; Moser, Herbert O.

Author_Institution

Forschungszentrum Karlsruhe GmbH, Germany

Volume

1

fYear

2001

fDate

2001

Firstpage

654

Abstract

The production of extreme ultraviolet radiation (13.5 nm or 11.3 nm wavelength) by relativistic electrons as a source for the Next Generation Lithography (NGL) based on the EUV-concept (13.5 nm or 11.3 nm wavelength) is discussed. The requirements of the lithography community are as follows: output power of 50 to 150 W within 2 % bandwidth and a maximum of 500 W outside this bandwidth. It is shown that among all other synchrotron radiation devices only a free electron laser (minimum beam energy 500 MeV) can (under certain circumstances) fulfil these requirements

Keywords

electron accelerators; free electron lasers; light sources; relativistic electron beams; storage rings; ultraviolet lithography; 11.3 nm; 13.5 nm; 50 to 150 W; 500 MeV; 500 W; EUV sources; FEL; Next Generation Lithography; extreme ultraviolet sources; free electron laser; relativistic electrons; storage rings; synchrotron radiation; Bandwidth; Free electron lasers; Lithography; Power generation; Semiconductor lasers; Storage rings; Synchrotron radiation; Ultraviolet sources; Undulators; X-ray lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 2001. PAC 2001. Proceedings of the 2001

Conference_Location

Chicago, IL

Print_ISBN

0-7803-7191-7

Type

conf

DOI

10.1109/PAC.2001.987596

Filename

987596