• DocumentCode
    3779706
  • Title

    Verification of an analytic model for latchup in epitaxial CMOS

  • Author

    A. Chatterjee;J. A. Seitchik;J. H. Chorn;P. Vang;C-C Wei

  • Author_Institution
    Semiconductor Process and Design Center, Texas Instruments, Inc., MS 369. P.O. Box 655621. Dallas. Tx 75265
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    83
  • Lastpage
    84
  • Abstract
    This paper presents 2D simulation mid experimental results for direct verification of an analytic model for the holding voltage in epitaxial CMOS that emphasized the role of conductivity modulation. Improvement in the holding voltage with lower doping in the anode and cathode regions, as predicted by the model, is compared with simulation results. The key concept of the model is the equivalence of a 2D thyristor 10 a p-i-n diode of the same geometry. This paper verifies this concept. Simulated as well as experimentally determined I-V characteristics of thyristors are compared wit h those of p-i-n diodes.
  • Keywords
    "Thyristors","P-i-n diodes","Semiconductor process modeling","Anodes","Doping","Geometry","Semiconductor device modeling"
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. SymVLSITech 1987. Symposium on
  • Print_ISBN
    978-1-5090-3151-1
  • Type

    conf

  • Filename
    7508733