DocumentCode
3779706
Title
Verification of an analytic model for latchup in epitaxial CMOS
Author
A. Chatterjee;J. A. Seitchik;J. H. Chorn;P. Vang;C-C Wei
Author_Institution
Semiconductor Process and Design Center, Texas Instruments, Inc., MS 369. P.O. Box 655621. Dallas. Tx 75265
fYear
1987
fDate
5/1/1987 12:00:00 AM
Firstpage
83
Lastpage
84
Abstract
This paper presents 2D simulation mid experimental results for direct verification of an analytic model for the holding voltage in epitaxial CMOS that emphasized the role of conductivity modulation. Improvement in the holding voltage with lower doping in the anode and cathode regions, as predicted by the model, is compared with simulation results. The key concept of the model is the equivalence of a 2D thyristor 10 a p-i-n diode of the same geometry. This paper verifies this concept. Simulated as well as experimentally determined I-V characteristics of thyristors are compared wit h those of p-i-n diodes.
Keywords
"Thyristors","P-i-n diodes","Semiconductor process modeling","Anodes","Doping","Geometry","Semiconductor device modeling"
Publisher
ieee
Conference_Titel
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN
978-1-5090-3151-1
Type
conf
Filename
7508733
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