Title :
Advanced excimer laser lithography
Author :
M. Endo;K. Nakagawa;Y. Hirai;M. Sasago;K. Ogawa;T. Ishihara
Author_Institution :
Semiconductor Research Center Matsushita Electric Ind. Co., Ltd, Koriguchi-shi, Osaka, 570 Japan
fDate :
5/1/1987 12:00:00 AM
Abstract :
The increased packing density and the superior performance of scaled down VLSI circuits owes much to the improvement in the resolution by the optical lithography, which has already cleared the one-micron lithographic barrier.
Keywords :
"Resists","Lithography","Bleaching","Laser applications","Photobleaching","Films"
Conference_Titel :
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN :
978-1-5090-3151-1
