• DocumentCode
    3779722
  • Title

    Advanced excimer laser lithography

  • Author

    M. Endo;K. Nakagawa;Y. Hirai;M. Sasago;K. Ogawa;T. Ishihara

  • Author_Institution
    Semiconductor Research Center Matsushita Electric Ind. Co., Ltd, Koriguchi-shi, Osaka, 570 Japan
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    5
  • Lastpage
    6
  • Abstract
    The increased packing density and the superior performance of scaled down VLSI circuits owes much to the improvement in the resolution by the optical lithography, which has already cleared the one-micron lithographic barrier.
  • Keywords
    "Resists","Lithography","Bleaching","Laser applications","Photobleaching","Films"
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. SymVLSITech 1987. Symposium on
  • Print_ISBN
    978-1-5090-3151-1
  • Type

    conf

  • Filename
    7508748
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3779722