Title :
A CMOS A/D converter on laser recrystallized SOI with controlling the crystal growth direction
Author :
S. Kuaunoki;K. Sugahara;T. Nisliimura;T. Kumamoto;M. Nakaya;N. Yaiawa;Y. Horiba
Author_Institution :
LSI R & D Laboratory, Mitsubishi Electric Corporation, 4-1 Misuhara, Itami 664 Japan
fDate :
5/1/1987 12:00:00 AM
Abstract :
The new laser recrystallization technique which enabled to form the (001) textured SOI with few crystalline defects was developed, and successfully applied for CMOS ICs with analog function for the first time. This technique will widely contribute to the higher performance and the larger scale integration of CMOS-ICs and/or 3-D ICs.
Keywords :
"Lasers","MOSFET","Crystals","Silicon","Films","Surface treatment","Analog-digital conversion"
Conference_Titel :
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN :
978-1-5090-3151-1