Title :
0.5μm CMOS technology for 5.6nsec high speed 16×16 bit multiplier
Author :
Kazushi Tsuda;Hiroshi Takato;Maoko Takbnouchi;Kenji Tsuckiya;Yukihito Oowaki;Kenji Numata;Akihiro Nitayama
Author_Institution :
VLSI Research Center, TOSHIBA Corporation, 1, Kornukai Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
fDate :
5/1/1987 12:00:00 AM
Abstract :
CMOS technology becomes indispensable for designing VLSI circuits because of high speed, wide noise margin, and low power dissipation. Moreover, scaled down half a micron CMOS circuits have a large impact on high speed operation, where the speed is comparable to that of bipolar and GaAs. However, when CMOS devices are scaled down to half micron, it is difficult to suppress punchthrough and parasitic resistance for PMQSFETs and hot carrier degradation for NMOSFETs.
Keywords :
"Logic gates","Resistance","MOSFET","CMOS integrated circuits","Gallium arsenide","Capacitance","Reliability"
Conference_Titel :
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN :
978-1-5090-3151-1