Title :
Some recent studies of random noise between metals and dielectrics
Author_Institution :
General Electric Research Laboratory, Schenectady, N. Y., USA
Abstract :
The purpose of these studies was to investigate the source of noise which is generated when thin dielectrics are subjected to relatively low D.C. voltages(1,2). If the measured noise voltage is caused by the movement of ions or electrons in the volume of the dielectric between electrodes as shown by Haworth and Bozorth(3), then a semi-quantitative measurement of this noise might be a means whereby prebreakdown avalanches could be studied.
Keywords :
"Electrodes","Dielectrics","Dielectric measurement","Films","Noise measurement","Plastics","Voltage measurement"
Conference_Titel :
Electrical Insulation, 1955 Conference On
Print_ISBN :
978-1-5090-3132-0
DOI :
10.1109/EIC.1955.7533338