DocumentCode
3782851
Title
A method for pressure control in plasma processing
Author
Z. Zirojevic;M. Zlatanovic
Author_Institution
Sch. of Electr. Eng., Belgrade Univ., Serbia
Volume
1
fYear
2000
Firstpage
265
Abstract
A simple system for pressure control in a plasma processing unit for surface treatment of materials was described, The system consists of two thermal mass controllers for the working gas mixture adjustment at the vacuum chamber inlet and three on-off vacuum valves at the chamber outlet. An algorithm for computer control of the dynamic pressure in the process chamber at various working gas composition was described and the measured characteristics of a three valve throttling system given.
Keywords
"Pressure control","Plasma materials processing","Valves","Control systems","Vacuum systems","Surface treatment","Plasma measurements","Plasma density","Nitrogen","Weight control"
Publisher
ieee
Conference_Titel
Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
Print_ISBN
0-7803-5235-1
Type
conf
DOI
10.1109/ICMEL.2000.840570
Filename
840570
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