DocumentCode :
3784395
Title :
Ion projection direct structuring for patterning of magnetic media
Author :
A. Dietzel;R. Berger;H. Grimm;W.H. Bruenger;C. Dzionk;F. Letzkus;R. Springer;H. Loeschner;E. Platzgummer;G. Stengl;Z.Z. Bandic;B.D. Terris
Author_Institution :
IBM Storage Technol. Div., Mainz, Germany
Volume :
38
Issue :
5
fYear :
2002
Firstpage :
1952
Lastpage :
1954
Abstract :
Ion projection facilitates a direct structuring, which is an attractive potential manufacturing process for patterned storage media. An advantage to this method is that the media roughness remains unchanged. The feasibility of ion projection direct structuring for processing full disk surfaces was investigated using a next generation lithography projector. Co-Pt multilayer films with strong perpendicular anisotropy were deposited on 1-in glass disks as used in the IBM microdrive and on Si substrates. Concentric tracks including data, as well as head positioning servo structures, were patterned in a single exposure step with 45 keV He/sup +/ at a 4 /spl times/ demagnification. In a second experiment, sub-100-nm magnetic islands were produced using projection at 8.7 /spl times/ demagnification and visualized by magnetic force microscopy.
Keywords :
"Manufacturing processes","Rough surfaces","Surface roughness","Lithography","Nonhomogeneous media","Semiconductor films","Anisotropic magnetoresistance","Glass","Magnetic heads","Servomechanisms"
Journal_Title :
IEEE Transactions on Magnetics
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2002.802846
Filename :
1042055
Link To Document :
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