DocumentCode :
3784480
Title :
Formation of TbFe amorphous thin films by high dose implantation of Tb ions and their magnetic properties
Author :
Y. Gondo;Y. Suezawa;R. Tsuchiya
Author_Institution :
Yokohama National University, Yokohama, Japan
Volume :
20
Issue :
5
fYear :
1984
Firstpage :
1314
Lastpage :
1316
Abstract :
The decrease was observed in the magnetic moment in unit area of the Fe films implanted with high dose Tb ions. This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films implanted with high dose Dy ions. The formation of an amorphous Tb-Fe layer was revealed by electron diffraction observations when Tb dose was high. It was found that an in-plane uniaxial magnetic anisotropy was induced when a magnetic field was applied in the plane of Fe films during Tb ion implantation at room temperature.
Keywords :
"Amorphous materials","Magnetic films","Magnetic properties","Magnetic moments","Iron alloys","Magnetic multilayers","Electrons","Diffraction","Magnetic anisotropy","Magnetic fields"
Journal_Title :
IEEE Transactions on Magnetics
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1984.1063436
Filename :
1063436
Link To Document :
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