DocumentCode
3787884
Title
Selective oxygen plasma etching of coatings
Author
U. Cvelbar;M. Mozetic;M. Klanjsek-Gunde
Author_Institution
Plasma Lab., Jozef Stefan Inst., Ljubljana, Slovenia
Volume
33
Issue
2
fYear
2005
Firstpage
236
Lastpage
237
Abstract
The technology of selective oxygen plasma etching is presented. It enables the evaluation of the state of pigment dispersion, as well as the distribution of other solid particles that are added in pigmented coatings for various functional purposes. The technology is based on the selective interaction of reactive gaseous particles from oxygen plasma with the pigment-polymer composite. In our case, we wanted to etch the polymer matrix while leaving the particles untouched. Scanning electron microscope images of the effects of exposing the composite to oxygen plasma are presented.
Keywords
"Oxygen","Plasma applications","Etching","Coatings","Polymers","Pigmentation","Plasma materials processing","Plasma density","Plasma measurements","Electrons"
Journal_Title
IEEE Transactions on Plasma Science
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2005.845345
Filename
1420414
Link To Document