DocumentCode :
37886
Title :
CMOS Compatible Fabrication Processes for the Digital Micromirror Device
Author :
Cuiling Gong ; Hogan, Tim
Author_Institution :
Dept. of Eng., Texas Christian Univ., Fort Worth, TX, USA
Volume :
2
Issue :
3
fYear :
2014
fDate :
May-14
Firstpage :
27
Lastpage :
32
Abstract :
DLP® technology has been widely used in the display products since it was first introduced to the world in 1996 by Texas Instruments. Projectors powered by DLP® technology range from cinema projectors that light up large movie theater screens to palm-sized “Pico” projectors. The heart of the technology is the digital micromirror device (DMD) that features an addressable array of up to 8 million microscopic mirrors. DMDs are fabricated using standard semiconductor processing equipment. However due to the unique nature of MOEMS application and digital operation of the DMDs, special CMOS-compatible fabrication processes have been developed to produce highly reflective digital micromirrors with robust operation margin and long term reliability. This paper will present an overview of the fabrication processes of the DMDs.
Keywords :
CMOS digital integrated circuits; microfabrication; micromirrors; CMOS compatible fabrication processes; digital micromirror device; long term reliability; operation margin; Fabrication; Fasteners; Films; Metals; Micromirrors; Resists; DLP; DMD; Microelectromechanical devices; fabrication; spatial light modulators;
fLanguage :
English
Journal_Title :
Electron Devices Society, IEEE Journal of the
Publisher :
ieee
ISSN :
2168-6734
Type :
jour
DOI :
10.1109/JEDS.2014.2309129
Filename :
6774433
Link To Document :
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