Automatic profiling of a steady state temperature field in thermochemical systems and devices

This article presents a method of the steady state temperature profiling in the case of industrial thermochemical systems. A problem of this type represents an important element of the production processes in different industrial area such as material engineering, manufacturing of semiconductor devices, very large scale integration (VLSI) systems, monocrystals growth, etc. The proposed method is oriented toward the automation of the profiling process, allowing to significantly reduce the duration of this operation. The paper covers the theoretical basis of the method as well as examples of industrial applications.