• DocumentCode
    3795737
  • Title

    Evolution of capture cross-section of radiation-induced interface traps in MOSFETs as studied by a rapid charge pumping technique

  • Author

    W. Chen;A. Balasinski;T.-P. Ma

  • Author_Institution
    Dept. of Electr. Eng., Yale Univ., New Haven, CT, USA
  • Volume
    39
  • Issue
    6
  • fYear
    1992
  • Firstpage
    2152
  • Lastpage
    2157
  • Abstract
    Using a rapid charge pumping technique, it was found that the mean capture cross-section of interface traps in MOSFETs sharply decreased immediately after irradiation. Further changes of the capture cross-section during subsequent relaxation depended on the gate bias during both irradiation and storage. Radiation dose dependence has also been investigated. Possible mechanisms and correlations between interface-trap density and capture cross-section are discussed.
  • Keywords
    "MOSFETs","Charge pumps","Pulse measurements","Frequency measurement","Charge carrier processes","Current measurement","Charge measurement","Electron traps","Equations","Voltage"
  • Journal_Title
    IEEE Transactions on Nuclear Science
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.211416
  • Filename
    211416