DocumentCode :
3795831
Title :
High temperature silicon carbide MOSFETs with very low drain leakage current
Author :
T. Billon;T. Ouisse;P. Lassagne;C. Jassaud;J.L. Ponthenier;L. Baud;N. Becourt;P. Morfouli
Author_Institution :
CEA-Technol. Avancees, Grenoble, France
Volume :
30
Issue :
2
fYear :
1994
Firstpage :
170
Lastpage :
171
Abstract :
Inversion mode n-channel MOSFETs have been built on (6H) silicon carbide (SiC) substrates, with thermal oxide as the gate insulator, and with channel lengths ranging from 1 to 25 mu m. Drain leakage currents lower than 0.04 pA/ mu m channel width have been experimentally obtained at temperatures up to 400 degrees C and V/sub d/=5 V.
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19940098
Filename :
265336
Link To Document :
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