DocumentCode
379905
Title
Realization of high efficiency in a plasma-assisted microwave source with two-dimensional electron motion
Author
Shkvarunets, A.G. ; Carmel, Y. ; Nusinovich, G.S. ; Abu-elfadl, T.M. ; Rodgers, J. ; Antonsen, T.M., Jr. ; Granatstein, V. ; Goebel, D.M.
Author_Institution
Maryland Univ., College Park, MD, USA
fYear
2002
fDate
2002
Firstpage
52
Abstract
Summary form only given. A plasma-assisted slow wave oscillator (pasotron) may be operated without an external magnetic field allowing for radial motion of the electrons. This phenomenon has been exploited to achieve an increase in interaction efficiency from ∼20% to ∼50% by injecting electrons into the weak RF field region near the axis and having them bunch as they move axially and radially toward the surface of the slow wave circuit where RF fields are strong and efficient energy extraction occurs. Both in-situ diagnostics and analysis confirmed that the enhanced interaction efficiency is due to the fact that RF forces dominate the beam dynamics.
Keywords
electron beams; microwave oscillators; microwave tubes; particle beam bunching; particle beam dynamics; slow wave structures; 2D electron motion; 50 percent; RF field region; beam dynamics; electron bunching; electron injection; interaction efficiency enhancement; pasotron; plasma-assisted microwave source; plasma-assisted slow wave oscillator; slow wave circuit; Circuits; Educational institutions; Electrons; Magnetic fields; Oscillators; Plasma sources; Plasma waves; Radio frequency; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2002. IVEC 2002. Third IEEE International
Print_ISBN
0-7803-7256-5
Type
conf
DOI
10.1109/IVELEC.2002.999256
Filename
999256
Link To Document