• DocumentCode
    3805022
  • Title

    Thermodynamic and Kinetic Aspects of Heterogeneous Reactions in a Nonisothermal Low Pressure Plasma

  • Author

    S. Veprek

  • Author_Institution
    Institute of Inorganic Chemistry, University of Z?rich, R?mistrasse 76, 8001 Z?rich, Switzerland
  • Volume
    2
  • Issue
    1
  • fYear
    1974
  • fDate
    3/1/1974 12:00:00 AM
  • Firstpage
    25
  • Lastpage
    33
  • Abstract
    Because of its high energy content and a relatively low translational temperature, the plasma of an intense low pressure discharge in a molecular gas is suitable for deposition of thin films and growth of crystals. A simple theoretical approach for estimation of chemical equilibrium composition in such systems has been developed. This approach is useful for planning of experiments, and it opens a way for further, more rigorous theoretical investigations.
  • Keywords
    "Thermodynamics","Kinetic theory","Plasma chemistry","Plasma applications","Plasma temperature","Plasma materials processing","Plasma transport processes","Chemical compounds","Sputtering","Electron tubes"
  • Journal_Title
    IEEE Transactions on Plasma Science
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.1974.4316801
  • Filename
    4316801