Title :
Thermodynamic and Kinetic Aspects of Heterogeneous Reactions in a Nonisothermal Low Pressure Plasma
Author_Institution :
Institute of Inorganic Chemistry, University of Z?rich, R?mistrasse 76, 8001 Z?rich, Switzerland
fDate :
3/1/1974 12:00:00 AM
Abstract :
Because of its high energy content and a relatively low translational temperature, the plasma of an intense low pressure discharge in a molecular gas is suitable for deposition of thin films and growth of crystals. A simple theoretical approach for estimation of chemical equilibrium composition in such systems has been developed. This approach is useful for planning of experiments, and it opens a way for further, more rigorous theoretical investigations.
Keywords :
"Thermodynamics","Kinetic theory","Plasma chemistry","Plasma applications","Plasma temperature","Plasma materials processing","Plasma transport processes","Chemical compounds","Sputtering","Electron tubes"
Journal_Title :
IEEE Transactions on Plasma Science
DOI :
10.1109/TPS.1974.4316801
