DocumentCode :
3810680
Title :
Locally one-dimensional approach to diffusion process simulation in nonplanar domains
Author :
S. Mitrovic;S. Mijalkovic;N. Stojadinovic
Author_Institution :
Fac. of Electron. Eng., Nis Univ., Serbia
Volume :
31
Issue :
20
fYear :
1995
Firstpage :
1788
Lastpage :
1789
Abstract :
A new approach to diffusion process simulation in 2-D domains with nonplanar and moving boundaries, which combines the orthogonal numerical co-ordinate transformation associated with the alternative direction implicit (ADI) solving procedure and geometric splitting of the impurity diffusion equation into locally one-dimensional problems is proposed.
Keywords :
"Semiconductor process modeling","Semiconductor device doping","Diffusion processes"
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19951175
Filename :
469256
Link To Document :
بازگشت