DocumentCode
3810734
Title
Analytical Model of $I$ – $V$ Characteristics of Arbitrarily Shallow p-n Junctions
Author
Milos Popadic;Gianpaolo Lorito;Lis K. Nanver
Author_Institution
Delft Inst. of Microsyst. & Nanoelectron., Delft Univ. of Technol., Delft
Volume
56
Issue
1
fYear
2009
Firstpage
116
Lastpage
125
Abstract
For the first time, an analytical model of arbitrarily shallow p-n junctions is presented. Depending on the junction depth, electrical characteristics of ultrashallow p-n junctions can vary from the characteristics of standard Schottky diodes to standard deep p-n junctions. This model successfully unifies the standard Schottky and p-n diode expressions. In the crossover region, where the shallow doping region can be totally depleted, electrical characteristics phenomenologically substantially different from typical diode characteristics are predicted. These predictions and the accuracy of the presented model are evaluated by comparison with the MEDICI simulations. Furthermore, ultrashallow n+-p diodes were fabricated, and the anomalous behavior in the crossover regime was experimentally observed.
Keywords
"Analytical models","Junctions","P-n junctions","Schottky diodes","Doping","Metals","Approximation methods"
Journal_Title
IEEE Transactions on Electron Devices
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2008.2009028
Filename
4717238
Link To Document