Tribological characteristics of SiO/sub 2/ films investigated by scanning probe microscopy

Tribological characteristics of newly-proposed SiO/sub 2/ films deposited in hydrogen-argon mixtures, the Si substrate, the fused quartz target, and thermally-grown SiO/sub 2/ were investigated by simultaneously measuring the friction and wear using scanning probe microscopy. At low normal loads, wear did not appear when the friction force increased linearly with load, however, significant wear occurred when the friction force increased rapidly at higher loads. The wear regime of SiO/sub 2/ films closely agreed with the friction change as simultaneously measured in the same area. The friction and wear of the sputtered SiO/sub 2/ films were lowest at a 30% hydrogen concentration. The film deposited at 30% hydrogen had very similar wear durability to thermally-grown SiO/sub 2/, but higher durability than fused quartz target.