DocumentCode :
381769
Title :
Gamma radiation dosimetry using tellurium dioxide thin film structures
Author :
Arshak, Khalil ; Korostynska, Olga
Author_Institution :
Dept. of Electron. & Comput. Eng., Limerick Univ., Ireland
Volume :
1
fYear :
2002
fDate :
2002
Firstpage :
547
Abstract :
Thin films of tellurium dioxide (TeO2) were investigated for γ-radiation dosimetry purposes. Samples were fabricated using thin film vapour deposition technique. Thin films of TeO2 were exposed to a 60Co γ-radiation source at a dose rate of 6 Gy/min at room temperature. Absorption spectra for TeO2 films were recorded and the values of the optical band gap and energies of the localized states for as-deposited and γ-irradiated samples were calculated. It was found that the optical band gap values were decreased as the radiation dose was increased. Samples with electrical contacts having a planar structure showed a linear increase in current values with the increase in radiation dose up to a certain dose level. The observed changes in both the optical and the electrical properties suggest that TeO2 thin film may be considered as an effective material for room temperature real time γ-radiation dosimetry.
Keywords :
dosimetry; energy gap; gamma-ray detection; gamma-ray spectroscopy; optical constants; radiation monitoring; tellurium compounds; vacuum deposition; vapour deposited coatings; TeO2; energy-dispersive spectroscopy; gamma radiation dosimetry; localized states; optical band gap; planar structure; radiation dose; thin film vapour deposition technique; Chemical vapor deposition; Dosimetry; Gamma rays; Optical films; Optical recording; Photonic band gap; Sputtering; Tellurium; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2002. Proceedings of IEEE
Print_ISBN :
0-7803-7454-1
Type :
conf
DOI :
10.1109/ICSENS.2002.1037155
Filename :
1037155
Link To Document :
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