• DocumentCode
    3846111
  • Title

    From Atomistic to Device Level Investigation of Hybrid Redox Molecular/Silicon Field-Effect Memory Devices

  • Author

    Tiziana Pro;Julien Buckley;Régis Barattin;Adrian Calborean;Venera Aiello;Giuseppe Nicotra;Kai Huang;Marc Gély;Guillaume Delapierre;Eric Jalaguier;Florence Duclairoir;Nicolas Chevalier;Salvatore Lombardo;Pascale Maldivi;Gérard Ghibaudo

  • Author_Institution
    Electronics and Information Technology Laboratory, French Atomic Energy Commission (CEA-LETI), MINATEC,Grenoble, France
  • Volume
    10
  • Issue
    2
  • fYear
    2011
  • Firstpage
    275
  • Lastpage
    283
  • Abstract
    In this paper, an extensive investigation of hybrid molecular/Si field-effect memories is presented, where redox ferrocene (Fc) molecules play the role of the memory charge storage nodes. Engineering of the organic linkers between Fc and Si is achieved by grafting Fc with different linker lengths. The study shows a clear correlation between results from atomistic computational density functional theory, electrochemical measurements (cyclic voltammetry) and electrical data obtained by a detailed study on capacitors and pseudo-MOS devices. Physical-chemical analyses (atomic force microscopy, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy), corroborate the quality of molecular layers on devices.
  • Keywords
    "Silicon","Atomic measurements","Atomic force microscopy","Atomic layer deposition","Photoelectron microscopy","Transmission electron microscopy","Density functional theory","Density measurement","Electric variables measurement","Capacitors"
  • Journal_Title
    IEEE Transactions on Nanotechnology
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2009.2038612
  • Filename
    5373934