DocumentCode :
3846185
Title :
RF Performance of InAlN/GaN HFETs and MOSHFETs With $f_{T} \times L_{G}$ up to 21 $\hbox{GHz}\cdot \mu\hbox{m}$
Author :
Peter Kordos;Martin Mikulics;Alfred Fox;Dagmar Gregusova;Karol Cico;Jean-Francois Carlin;Nicolas Grandjean;Jozef Novak;Karol Frohlich
Author_Institution :
Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia
Volume :
31
Issue :
3
fYear :
2010
fDate :
3/1/2010 12:00:00 AM
Firstpage :
180
Lastpage :
182
Abstract :
The RF performance of lattice-matched InAlN/GaN heterostructure field-effect transistors (HFETs) and Al2O3/InAlN/GaN metal-oxide-semiconductor HFETs (MOSHFETs) with varied gate length was evaluated. The current gain cutoff frequency fT and the maximum oscillation frequency f max for the HFETs with 0.3-μm gate length were 54 and 58 GHz, respectively. An increase of fT to 61 GHz and off max to 70 GHz was obtained for the MOSHFETs. The HFETs and MOSHFETs with different gate length yielded an fT ? LG product of 18 and 21 GHz ? μm, respectively. These are higher values than reported yet on InAlN/GaN devices and similar to those known for AlGaN/GaN HFETs.
Keywords :
"Radio frequency","Gallium nitride","HEMTs","MODFETs","MOSHFETs","Aluminum gallium nitride","Cutoff frequency","FETs","Transconductance","Information technology"
Journal_Title :
IEEE Electron Device Letters
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2038078
Filename :
5398905
Link To Document :
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