DocumentCode
3846727
Title
CMOS foundry implementation of Schottky diodes for RF detection
Author
V. Milanovic;M. Gaitan;J.C. Marshall;M.E. Zaghloul
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., George Washington Univ., Washington, DC, USA
Volume
43
Issue
12
fYear
1996
Firstpage
2210
Lastpage
2214
Abstract
Schottky diodes for RF power measurement were designed and fabricated using a commercial n-well CMOS foundry process through the MOSIS service. The Schottky diodes are implemented by modifying the SCMOS technology file of the public-domain graphics layout editor, MAGIC, or by explicitly implementing the appropriate CIF layers. The modifications allow direct contact of first-layer metal to the low-doped substrate. Current-voltage measurements showed that only the n-type devices had rectifying properties with a barrier height of 0.78 eV. The I-V results were verified by performing capacitance-voltage measurements on diodes of different contact-areas. The diodes were tested in an RF detector circuit. The cut off frequency of the detector was shown to be 600 MHz.
Keywords
"Foundries","Schottky diodes","Radio frequency","Circuit testing","Detectors","Power measurement","CMOS process","Appropriate technology","CMOS technology","Graphics"
Journal_Title
IEEE Transactions on Electron Devices
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.544393
Filename
544393
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