DocumentCode
3850041
Title
Evaluation of a Gate Capacitance in the Sub-aF Range for a Chemical Field-Effect Transistor With a Si Nanowire Channel
Author
Nicolas Clément;Katsuhiko Nishiguchi;Akira Fujiwara;Dominique Vuillaume
Author_Institution
Centre National de la Recherche Scientifique, France
Volume
10
Issue
5
fYear
2011
Firstpage
1172
Lastpage
1179
Abstract
An evaluation of the gate capacitance of a field-effect transitor (FET), whose channel length and width are several ten nanometer, is a key point for sensors applications. However, experimental and precise evaluation of capacitance in the attofarad range or less has been extremely difficult. Here, we report an extraction of the capacitance down to 0.55 aF for a Si FET with a nanoscale wire channel, whose width and length are 15 and 50 nm, respectively. The extraction can be achieved by using a combination of four kinds of measurements: current characteristics modulated by double gates, random-telegraph-signal noise induced by trapping and detrapping of a single electron, dielectric polarization noise, and current characteristics showing Coulomb blockade at low temperature. The extraction of such a small gate capacitance enables us to evaluate electron mobility in a nanoscale wire by using a classical model of current characteristics of an FET.
Keywords
"Capacitance","Logic gates","Silicon","Noise","Temperature measurement","Estimation","Temperature"
Journal_Title
IEEE Transactions on Nanotechnology
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2011.2123913
Filename
5727959
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