DocumentCode :
385247
Title :
Overview of nanolithography in Europe
Author :
Guibert, Jean-Charles
Author_Institution :
Minatec-Leti, CEA-Grenoble, Grenoble, France
Volume :
1
fYear :
2002
fDate :
2002
Abstract :
Summary form only given. Lithography is still the enabler technology, allowing movement along the roadmap, and new developments in this field are often led by European teams, whether academic or industrial ones. This paper looks in depth into nanolithography activities in Europe, which in fact cover a broad spectrum of technologies, from electron-beam to extreme UV, including nanoimprint, ion-beam and more innovative concepts.
Keywords :
electron beam lithography; ion beam lithography; nanolithography; ultraviolet lithography; EUV; Europe; electron-beam lithography; extreme UV lithography; ion-beam lithography; lithography enabler technology; nanoimprint lithography; nanolithography overview; Europe; Heart; History; Lithography; Nanolithography; Optical refraction; Resists; Throughput; Ultraviolet sources; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2002. CAS 2002 Proceedings. International
Print_ISBN :
0-7803-7440-1
Type :
conf
DOI :
10.1109/SMICND.2002.1105810
Filename :
1105810
Link To Document :
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