DocumentCode
385247
Title
Overview of nanolithography in Europe
Author
Guibert, Jean-Charles
Author_Institution
Minatec-Leti, CEA-Grenoble, Grenoble, France
Volume
1
fYear
2002
fDate
2002
Abstract
Summary form only given. Lithography is still the enabler technology, allowing movement along the roadmap, and new developments in this field are often led by European teams, whether academic or industrial ones. This paper looks in depth into nanolithography activities in Europe, which in fact cover a broad spectrum of technologies, from electron-beam to extreme UV, including nanoimprint, ion-beam and more innovative concepts.
Keywords
electron beam lithography; ion beam lithography; nanolithography; ultraviolet lithography; EUV; Europe; electron-beam lithography; extreme UV lithography; ion-beam lithography; lithography enabler technology; nanoimprint lithography; nanolithography overview; Europe; Heart; History; Lithography; Nanolithography; Optical refraction; Resists; Throughput; Ultraviolet sources; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2002. CAS 2002 Proceedings. International
Print_ISBN
0-7803-7440-1
Type
conf
DOI
10.1109/SMICND.2002.1105810
Filename
1105810
Link To Document