Photoluminescence of the nanocrystallites embedded in silicon oxide films

In the field of silicon based room temperature light emitting materials, besides porous silicon fabricated by anodization, other kinds of films fabricated by sputtering, gas vaporization, and chemical vapor deposition were investigated. These films are two phase structures, with nanocrystallites embedded in an amorphous matrix. From a technological point of view, the chemical stability and robustness of these materials are more suitable for future applications, unlike the rather delicate nature of porous silicon.