DocumentCode
3852598
Title
Investigations on AlN/sapphire piezoelectric bilayer structure for high-temperature SAW applications
Author
Thierry Aubert;Omar Elmazria;Badreddine Assouar;Eloi Blampain;Ahmad Hamdan;Damien Gen?ve;Sylvain Weber
Author_Institution
Institut Jean Lamour, UMR 7198, Centre National de la Recherche Scientifique (CNRS)?Nancy University, Vandoeuvre-les-Nancy, France
Volume
59
Issue
5
fYear
2012
fDate
5/1/2012 12:00:00 AM
Firstpage
999
Lastpage
1005
Abstract
This paper explores the possibility of using AlN/sapphire piezoelectric bilayer structures for high-temperature SAW applications. To determine the temperature stability of AlN, homemade AlN/sapphire samples are annealed in air atmosphere for 2 to 20 h at temperatures from 700 to 1000°C. Ex situ X-ray diffraction measurements reveal that the microstructure of the thin film is not affected by temperatures below 1000°C. Ellipsometry and secondary ion mass spectroscopy investigations attest that AlN/sapphire is reliable up to 700°C. Beyond this temperature, both methods indicate ongoing surface oxidation of AlN. Additionally, Pt/Ta and Al interdigital transducers are patterned on the surface of the AlN film. The resulting SAW devices are characterized up to 500°C and 300°C, respectively, showing reliable frequency response and a large, quasi-constant temperature sensitivity, with a first-order temperature coefficient of frequency around -75 ppm/°C. Between room temperature and 300°C, both electromechanical coupling coefficient K2 and propagation losses increase, so the evolution of delay lines´ insertion losses with temperature strongly depends on the length of the propagation path.
Keywords
"Temperature measurement","Annealing","Temperature sensors","Films","Delay lines","Atmospheric measurements","Propagation losses"
Journal_Title
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/TUFFC.2012.2285
Filename
6202424
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