Title : 
Low Noise Microwave HIFET Using MOCVD
         
        
            Author : 
Takakuwa, H. ; Tanaka, K. ; Togashi, K. ; Ohke, H. ; Kanazawa, M. ; Kato, Y.
         
        
        
        
        
        
        
        
            Abstract : 
Low noise HIFET (Hetero Interface Field Effect Transistor, also known asTEGFET or HEMT) AIGaAs/GaAs heterostructure devices have been developed using Metal Organic Chemical Vapor Deposition (MOCVD). The HIFET´s with 0.5-micron long and 200-micron wide gates have shown a minimum noise figure of 0.87 dB with an associated gain of 12.5 dB at 12 GHz at room temperature. A substantial improvement in noise figure was obtained at lower temperatures (-l0°C), especially when compared to GaAs MESFET devices.
         
        
            Keywords : 
Chemical vapor deposition; FETs; Gain; Gallium arsenide; HEMTs; MOCVD; Microwave devices; Noise figure; Organic chemicals; Temperature;
         
        
        
        
            Conference_Titel : 
Microwave and Millimeter-Wave Monolithic Circuits
         
        
        
            DOI : 
10.1109/MCS.1986.1114487