• DocumentCode
    385923
  • Title

    Networks on silicon: blessing or nightmare?

  • Author

    Wielage, Paul ; Goossens, Kees

  • Author_Institution
    Philips Res. Labs., Eindhoven, Netherlands
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    196
  • Lastpage
    200
  • Abstract
    Continuing VLSI technology scaling raises several deep submicron (DSM) problems like relatively slow interconnect, power dissipation and distribution, and signal integrity. Those problems are encountered particularly on long wires for global interconnect. As clock frequencies increase, scaled wires become relatively slower and on-chip communication will be the limiting performance factor of future chips. We explain why efficiently sharing of the wires for long distance communication is the solution to this problem. We introduce networks on silicon (NoS), that route packets over shared (semi)-global wires. NoS performance is expected to be high, but comes at a cost. Balancing the performance and cost of a NoS is a major challenge, and we believe busses still have a role to play.
  • Keywords
    VLSI; integrated circuit technology; VLSI technology scaling; clock frequencies; deep submicron problems; networks on silicon; on-chip communication; power dissipation; power distribution; signal integrity; Bandwidth; Clocks; Costs; Delay effects; Laboratories; Moore´s Law; Silicon; Very large scale integration; Wires; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Digital System Design, 2002. Proceedings. Euromicro Symposium on
  • Print_ISBN
    0-7695-1790-0
  • Type

    conf

  • DOI
    10.1109/DSD.2002.1115369
  • Filename
    1115369