• DocumentCode
    3861938
  • Title

    Temperature and thickness dependence of steam oxidation of AlAs in cylindrical mesa structures

  • Author

    M. Osinski;T. Svimonishvili;G.A. Smolyakov;V.A. Smagley;P. Mackowiak;W. Nakwaski

  • Author_Institution
    Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
  • Volume
    13
  • Issue
    7
  • fYear
    2001
  • Firstpage
    687
  • Lastpage
    689
  • Abstract
    The Deal-Grove model of thermal oxidation kinetics is adapted to cylindrically symmetric mesa structures and applied to study steam oxidation of AlAs. Oxidation process parameters are extracted from available experimental data as functions of temperature and the AlAs layer thickness. The oxidation rate is found to be very sensitive not only to temperature, but also to the oxidation front position inside the mesa. The oxidation rate slows down as the oxidation front moves into the mesa, reaches a minimum, and then accelerates at the final stages of the oxidation process. Complex nonmonotonic dependence of the oxidation process on layer thickness is also revealed.
  • Keywords
    "Temperature dependence","Oxidation","Semiconductor process modeling","Vertical cavity surface emitting lasers","Surface emitting lasers","Laser modes","Semiconductor lasers","Kinetic theory","Temperature sensors","Optical device fabrication"
  • Journal_Title
    IEEE Photonics Technology Letters
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.930415
  • Filename
    930415