DocumentCode :
3862027
Title :
AlGaN/GaN Round-HEMTs on [111] silicon substrates
Author :
P. Javorka;A. Alam;N. Nastase;M. Marso;H. Hardtdegen;M. Heuken;H. Luth;P. Kordos
Author_Institution :
Inst. of Thin Films & Interfaces, Res. Centre Julich, Germany
Volume :
37
Issue :
22
fYear :
2001
Firstpage :
1364
Lastpage :
1366
Abstract :
AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static characteristics investigated. The AlGaN/GaN (x=0.23) material structures were grown on [111] p-Si by LP-MOVPE. Devices with 0.3 /spl mu/m gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak extrinsic transconductance of 110 mS/mm. Highest saturation current reported so far and static output characteristics up to 20 V demonstrate that the devices are capable of handling 16 W/mm of static heat dissipation without any degradation of their performance.
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20010926
Filename :
964299
Link To Document :
بازگشت