• DocumentCode
    3862055
  • Title

    AlGaN/GaN HEMTs on (111) silicon substrates

  • Author

    P. Javorka;A. Alam;M. Wolter;A. Fox;M. Marso;M. Heuken;H. Luth;P. Kordos

  • Author_Institution
    Inst. of Thin Films & Interfaces (ISG-1), Res. Centre Julich, Germany
  • Volume
    23
  • Issue
    1
  • fYear
    2002
  • Firstpage
    4
  • Lastpage
    6
  • Abstract
    AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF characteristics investigated. The AlGaN/GaN material structures were grown on (111) p-Si by LP-MOVPE. Devices exhibit a saturation current of 0.91 A/mm, a good pinchoff and a peak extrinsic transconductance of 122 mS/mm. A unity current gain frequency of 12.5 GHz and f/sub max//f/sub T/=0.83 were obtained. The highest saturation current reported so far, static output characteristics of up to 20 V and breakdown voltage at pinchoff higher than 40 V demonstrate that the devices are capable of handling /spl sim/16 W/mm static heat dissipation.
  • Keywords
    "Aluminum gallium nitride","Gallium nitride","HEMTs","MODFETs","Transconductance","Thermal conductivity","Substrates","Fabrication","Silicon carbide","Radio frequency"
  • Journal_Title
    IEEE Electron Device Letters
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.974794
  • Filename
    974794