DocumentCode :
3862055
Title :
AlGaN/GaN HEMTs on (111) silicon substrates
Author :
P. Javorka;A. Alam;M. Wolter;A. Fox;M. Marso;M. Heuken;H. Luth;P. Kordos
Author_Institution :
Inst. of Thin Films & Interfaces (ISG-1), Res. Centre Julich, Germany
Volume :
23
Issue :
1
fYear :
2002
Firstpage :
4
Lastpage :
6
Abstract :
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF characteristics investigated. The AlGaN/GaN material structures were grown on (111) p-Si by LP-MOVPE. Devices exhibit a saturation current of 0.91 A/mm, a good pinchoff and a peak extrinsic transconductance of 122 mS/mm. A unity current gain frequency of 12.5 GHz and f/sub max//f/sub T/=0.83 were obtained. The highest saturation current reported so far, static output characteristics of up to 20 V and breakdown voltage at pinchoff higher than 40 V demonstrate that the devices are capable of handling /spl sim/16 W/mm static heat dissipation.
Keywords :
"Aluminum gallium nitride","Gallium nitride","HEMTs","MODFETs","Transconductance","Thermal conductivity","Substrates","Fabrication","Silicon carbide","Radio frequency"
Journal_Title :
IEEE Electron Device Letters
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.974794
Filename :
974794
Link To Document :
بازگشت