• DocumentCode
    3863026
  • Title

    Black silicon as absorber for near-infrared photo-thermal conversion

  • Author

    Shi-Qiu Cheng; Bin Cai; Yi-Ming Zhu

  • Author_Institution
    Shanghai Key Lab of Modern Optical System and Engineering Research Center of Optical Instrument and System, Ministry of Education, University of Shanghai for Science and Technology, 200093, China
  • fYear
    2015
  • fDate
    6/15/2016 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    By a metal catalytic chemical etching method we obtained “black silicon” with very high absorption efficiency from ultraviolet to near infrared range. The characteristic of the black silicon as absorber for photo-thermal-electricity conversion was investigated.
  • Keywords
    "Silicon","Etching","Absorption","Chemicals","Metals","Optical device fabrication","Optical sensors"
  • Publisher
    ieee
  • Conference_Titel
    Opto-Electronics and Communications Conference (OECC), 2015
  • Electronic_ISBN
    2166-8892
  • Type

    conf

  • DOI
    10.1109/OECC.2015.7340311
  • Filename
    7340311
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3863026