DocumentCode :
3863047
Title :
TE-pass polarizer using metal vias for silicon-on-insulator platform
Author :
Humaira Zafar;Soha E. Yousuf;Anatol Khilo
Author_Institution :
Institute Center for Microsystems, Department of Electrical Engineering and Computer Science, Masdar Institute of Science and Technology, Abu Dhabi, United Arab Emirates
fYear :
2015
fDate :
6/15/2016 12:00:00 AM
Firstpage :
1
Lastpage :
3
Abstract :
A TE-pass polarizer that uses metal vias for absorption of TM light is proposed. A 100-micron device can achieve 20dB extinction ratio with 0.23dB insertion loss. The polarizer is compatible with standard silicon-on-insulator foundry processes.
Keywords :
"Insertion loss","Optical waveguides","Propagation losses","Metals","Silicon-on-insulator","Silicon photonics"
Publisher :
ieee
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2015
Electronic_ISBN :
2166-8892
Type :
conf
DOI :
10.1109/OECC.2015.7340333
Filename :
7340333
Link To Document :
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